TTK 600 – low temperature chamber
Versatile chamber for work at low to medium-high temperatures
The Anton Paar TTK 600 chamber is the successor of the TTK 450 low-temperature chamber. This new TTK 600 low-temperature chamber is equipped with an improved heating/cooling mechanism, extending the temperature range from -190 ºC to +600 ºC. TTK 600 enables in situ powder XRD measurements in both reflection and transmission and can be used with air, inert atmosphere or vacuum. If cooling below -10 ºC is not required, compressed air cooling can be used instead of liquid nitrogen cooling. Thermocouple is placed right underneath the sample for accurate temperature measure and control. Optional beam knife or beam stop can be placed inside the chamber for the improved low angle background in reflection or transmission, respectively.
From conventional XRD to basic thin film analysis
The TTK 600 chamber is designed for conventional in situ X-ray diffraction on powder samples at low to medium-high temperatures for the study of dynamic crystal structure changes, phase transformations, chemical reactions, etc. Furthermore basic phase composition, basic reflectometry and basic residual stress measurements on relatively thin samples can also be done with this chamber. TTK 600 is suitable for both organic and inorganic materials.