This is a two day course - part of the X-ray Diffraction Advanced Applications Courses (XRD AAC) week. It is intended for users seeking to expand their knowledge on thin film analysis by reflectometry methods. The course covers basic principles and practical aspects of X-ray reflectometry for layer structure and interface morphology. To help you to get the best possible result out of your analysis, emphasis is placed on selecting the most appropriate hardware and data collection strategies to match your sample. Our Advanced Materials Analysis Software Suite (AMASS) will be used to analyze the reflectivity curves and 2D datasets collected. Simulation of various example structures will be explained and their nature attuned to the interest of the course participants. Grazing incidence small angle x-ray scattering (GISAXS) will also be discussed as a complimentary technique.
The main aspects covered during the course are the following:
- Basic principles of X-ray Reflectometry
- Hardware components and their impact on data quality
- Practical aspects of sample alignment procedure and data collection
- Extracting information from reflectivity curves:
- Layer thicknesses
- RMS surface and interface roughness
- Interface morphology from diffuse scattering
- Extracting information from reciprocal space maps:
- Lateral coherence information
- Vertical coherence information
- Bragg peaks
- GISAXS analysis of film morphology
This is a paid course: Standard Industry $800 per participant, Academic or Government $400 per participant. Please register to secure your place early, due to the interactive nature, course seats are limited.
We reserve the right to cancel courses due to insufficient enrollment or unforeseen circumstances, such as weather. In the case of cancellation due to low enrollment, we will notify attendees by email asap.