X-ray fluorescence spectroscopy & XRF applications
X-ray fluorescence is an analytical technique that can be used to determine the chemical composition of a wide variety of sample types including solids, liquids, slurries and loose powders. XRF is also used to determine the thickness and composition of layers and coatings. It can analyze elements from beryllium (Be) to uranium (U) in concentration ranges from 100 wt% to sub-ppm levels.
XRF analysis is a robust technique, combining high precision and accuracy with straightforward, fast sample preparation. It can be readily automated for use in high-throughput industrial environments, plus XRF provides both qualitative and quantitative information on a sample. Easy combination of this ‘what?’ and ‘how much?’ information also makes rapid screening (semi-quantitative) analysis possible.
XRF is an atomic emission method, similar in this respect to optical emission spectroscopy (OES), ICP and neutron activation analysis (gamma spectroscopy). Such methods measure the wavelength and intensity of ‘light’ (X-rays in this case) emitted by energized atoms in the sample. In XRF, irradiation by a primary X-ray beam from an X-ray tube, causes emission of fluorescent X-rays with discrete energies characteristic of the elements present in the sample.
The technology used for the separation (dispersion), identification and intensity measurement of a sample’s X-ray fluorescence spectrum gives rise to two main types of spectrometer: wavelength dispersive (WDXRF) and energy dispersive (EDXRF) systems.
We offer a wide range of X-ray Fluorescence solutions and XRF spectrometers for the analysis of elemental composition of a wide range of materials and applications, and comprising both Wavelength and Energy Dispersive solutions. For more information on XRF analyzer prices, read our how much does an XRF analyzer cost page. Or discover our solution portfolio in the table below:
ZetiumSmart Zetium for reliable results and robust operation |
Epsilon rangeFast and accurate at- and on-line elemental analysis |
Axios FASTXRF of choice for highest throughput or shortest measurement time |
2830 ZTAdvanced semiconductor thin film metrology solution |
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| More details | More details | More details | More details | |
| Measurement type | ||||
| Thin film metrology | ||||
| Elemental analysis | ||||
| Contaminant detection and analysis | ||||
| Elemental quantification | ||||
| Chemical identification | ||||
| Technology | ||||
| Wavelength Dispersive X-ray Fluorescence (WDXRF) | ||||
| Energy Dispersive X-ray Fluorescence (EDXRF) | ||||
| Elemental range | Be-Am | F-Am | B-Am | B-Am |
| LLD | 0.1 ppm - 100% | 1 ppm - 100% | 0.1 ppm - 100% | 0.1 ppm - 100% |
| Resolution (Mn-Ka) | 35eV | 145eV | 35eV | 35eV |
| Sample throughput | Up to - 240per 8h day | Up to - 160per 8h day | Up to - 480per 8h day | up to 25 wafers per hour |
