In this report, the reproducibility and long-term stability is shown of the PANalytical 2830 ZT Wafer Analyzer in determining the boron and phosphorus concentration and film thickness of BPSG films. For the determination of the boron concentration, the gauge capability will be shown as a function of process tolerance.
In the semiconductor industry the monitoring of the deposition process of dielectrics such as BPSG is a demanding analytical application, requiring both high measurement accuracy and excellent precision. Wavelength dispersive X-ray fluorescence has been proven to meet these criteria.
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