In this report X-ray fluorescence and FP Multi are used to determine thickness and stoichiometry of TiNx thin films.

X-ray fluorescence spectrometry provides a non-destructive, highly reproducible and robust method of analyzing thin films on wafers. These attributes make XRF analysis a highly cost-effective method for the analysis of a large variety of films used in the semiconductor manufacturing process. 

Inicio de sesión

¿Aún no está registrado?

Sign up for free today. By registering you will have free access to exclusive content including

  • Webinars, presentations and videos
  • Application notes, technical notes, articles, white papers and software downloads

And in addition you will receive

  • Our regular eNews including the latest news, education, events and offers from Malvern Panalytical