FP Multi analysis of TiNx thin films on Si substrates

In this report X-ray fluorescence and FP Multi are used to determine thickness and stoichiometry of TiNx thin films.

X-ray fluorescence spectrometry provides a non-destructive, highly reproducible and robust method of analyzing thin films on wafers. These attributes make XRF analysis a highly cost-effective method for the analysis of a large variety of films used in the semiconductor manufacturing process. 

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