Reducing the need for layered reference materials

An outstanding advantage of the Stratos package is that excellent results are achieved with instruments calibrated using conventional bulk XRF standard or reference samples, whose composition and layer structure differ from those of the unknowns. This solves the common problem of obtaining expensive, certified thin films standards that, if available, match production samples as encountered in the analysis of semiconductor wafers and plated metals. If the Omnian option is also available the standards and calibration of Omnian can be directly used for Stratos.


The Virtual Analyst - method development made easy

The Stratos software module includes the Virtual Analyst, your consultant for advanced method development. Based on a definition of your sample structure, the Virtual Analyst simulates fluorescent response of the sample and gives you the optimal settings for analysis, thereby eliminating time-consuming trial-and-error experiments normally required to set up these complicated applications.


Advanced algorithms fluorescence model for complicated stacks

Stratos uses fundamental parameters to calculate both theoretical X-ray intensities for each constituent and Compton scattered intensities from the sample. They are then correlated with measured intensities from reference standards, in order to obtain the essential instrumental factors that form the basis of the calculations. To characterize unknown samples, estimated compositions are entered for the one or more layers present. A repeated process of refinement is employed until a close match is achieved with the measured values.

Stratos enables accurate thickness and composition determination for coating and packaging industries. The key advantages include maximized multi-layer capability, minimized calibration costs, full flexibility and ease of use because of the intuitive recipe setup with the aid of the Virtual Analyst and the push-button analysis with automatic reporting. Analysis can be executed without operator intervention and data can be transmitted to a LIMS or - by using UAI - to a factory host system. Results are presented as element percentages or mass thicknesses.