From conventional XRD to basic SAXS and reflectivity measurements

Thanks to the design of HTK 1200N the range of possible applications is broad, from the conventional in situ X-ray diffraction on powder and bulk samples to basic thin film analysis and residual stress measurements. Furthermore, basic small-angle X-ray scattering (SAXS) and total X-ray scattering for pair distribution function analysis (PDF) can also be done with this chamber.

Automatic analysis of large amounts of X-ray diffraction data with HighScore Plus

Application Note