X-ray metrology
Improving film quality by thin film metrology
Improving film quality by thin film metrology
Malvern Panalytical offers metrology solutions for the development and production control of layer-structured based micro- and optoelectronic devices.
Thin film metrology tools based on X-ray methods, such as XRD, XRR and XRF, are fast and non-destructive. They have proven to be powerful for ex-situ investigation of critical materials parameters of thin layers, heterostructures and superlattice systems down to nanometer scale.
The resulting information is essential for optimizing film quality, enhancing production efficiency and reducing costs.
Advanced semiconductor thin film metrology solution
Versatile research & development XRD system
Versatile research, development & quality control XRD system
