X'Pert³ MRD XL Pre-installation manual (English)
Version number: 6
Overview
The long and successful history of Malvern Panalytical's Materials Research Diffractometers (MRD) continues with the generation of X’Pert³ MRD XL.
The improved performance and reliability of the new platform have added more analytical capability and power for X-ray scattering studies in:
- advanced materials science
- scientific and industrial thin film technology
- metrological characterization in semiconductor process development
The X’Pert³ MRD XL handles a wide range of applications with full wafer mapping up to 200 mm.
Futureproof system flexibility
The X'Pert³ MRD systems offer advanced and innovative X-ray diffraction solutions from research to process development and process control.
These technologies make all systems field-upgradable to all existing options and new developments in hardware and software to come.
Extended MRD (XL)
The X'Pert³ Extended MRD (XL) brings increased versatility to the range of X'Pert³ MRD systems. An extra PreFIX mounting platform allows mounting of an X-ray mirror and a high-resolution monochromator in-line, significantly increasing the intensity of the incident beam.
You can benefit from increased application versatility without compromise on data quality, high-resolution X-ray diffraction with high intensities, shorter measurement times for measurements such as reciprocal space mapping and rebuild from standard to extended configuration in minutes thanks to the PreFIX concept. With the 2nd generation PreFIX, reconfiguring is easy and optics positioning is more accurate than ever.
MRD (XL) In-plane
With the X'Pert³ MRD (XL) system for in-plane diffraction, it becomes possible to measure diffraction from lattice planes that are perpendicular to the sample surface.
Standard and in-plane geometries on one system and a wide range of diffraction experiments on polycrystalline and highly perfect thin films, are just two of many benefits.
Download the brochure: Semiconductor wafers - Crystalline quality
Key applications
The Malvern Panalytical X’Pert³ MRD and MRD XL are all-in-one X-ray solution systems that can be used in many industry applications, including:
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- Semiconductors and single crystal wafers
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Whether for growth studies or device design, the measurement of layer quality, thickness, strain and alloy composition using high-resolution XRD has been at the heart of research and development in electronic and optoelectronic multilayer semiconductor devices. With a choice of X-ray mirrors, monochromators and detectors, the X’Pert3 MRD and MRD XL offer high-resolution configurations to suit different materials systems ranging from lattice-matched semiconductors, through relaxed buffer layers on to novel exotic layers on non-standard substrates
- Polycrystalline solids and thin films
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Polycrystalline layers and coatings are an important component of many thin films and multilayer devices. The evolution of polycrystalline layer morphology during deposition is a key study area in functional materials research and development. X’Pert3 MRD and X’Pert3 MRD XL can be fully equipped with a range of slits, parallel beam X-ray mirror, polycapillary lens, crossed slits and monocapillaries to give the full choice of incident beam optics for reflectometry, stress, texture and phase ID.
- Ultra-thin films, nanomaterials and amorphous layers
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Functional devices may contain disordered, amorphous or nanocomposite thin films. The flexibility of the X’Pert3 MRD and MRD XL systems allows for the incorporation of multiple analytical methods. A range of high-resolution optics, slits and parallel plate collimators are available to give the optimum performance for grazing incidence methods, in-plane diffraction and reflectometry.
- Measurement under non-ambient conditions
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Studying the behavior of materials under a variety of conditions is an essential part of materials research and process development. The X’Pert3 MRD and MRD XL are designed for the easy incorporation of the DHS1100 non-ambient sample stage from Anton Paar, enabling automated measurements under a range of temperatures and inert atmosphere
Instrument gives excellent accuracy and is of good quality.Good intensity and rapid performance. It is easy to operate.
Yifan Zheng — Zhejiang University of Technology
