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X'Pert³ MRD XL

Versatile research, development & quality control XRD system

The long and successful history of Malvern Panalytical's Materials Research Diffractometers (MRD) continues with the generation of X’Pert³ MRD XL. The improved performance and reliability of the new platform have added more analytical capability and power for X-ray scattering studies in:

  • advanced materials science
  • scientific and industrial thin film technology
  • metrological characterization in semiconductor process development

The X’Pert³ MRD XL handles wide range of applications with full wafer mapping up to 200 mm.

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Future-proof system flexibility

The X'Pert³ MRD systems offer advanced and innovative X-ray diffraction solutions from research to process development and process control. The used technologies make all systems field upgradable to all existing options and new developments in hardware and software to come.

X'Pert³ Extended MRD (XL)

The X'Pert³ Extended MRD (XL) brings increased versatility to the range of X'Pert³ MRD systems. An extra PreFIX mounting platform allows mounting of an X-ray mirror and a high-resolution monochromator in-line, increasing significantly the intensity of the incident beam.

One can benefit from increased application versatility without compromise on data quality, high-resolution X-ray diffraction with high intensities, shorter measurement times for measurements such as reciprocal space mapping and rebuild from standard to extended configuration in minutes thanks to the PreFIX concept. With the 2nd generation PreFIX, reconfiguring is easy and optics positioning is more accurate than ever.

X'Pert³ MRD (XL) In-plane

With the X'Pert³ MRD (XL) system for in-plane diffraction, it becomes possible to measure diffraction from lattice planes that are perpendicular to the sample surface.

Standard and in-plane geometries on one system and a wide range of diffraction experiments on polycrystalline and highly perfect thin films, are just two of many benefits. 

Download the brochure: Semiconductor wafers - Crystalline quality

Smart Manager

Unleash the potential of your data

Until now, instrument data has too often been stuck in manual records, spreadsheets or site-specific servers. By connecting the X'Pert3 MRD XL to our Smart Manager and continually analyzing instrument data in the cloud, you can unleash its full potential. This is just one of our digital solutions that are part of Malvern Panalytical's Smart Manager.


Dimensions 1370 (w) x 1131 (d) x 1972 (h) mm
System is on wheels for easy installation and relocation
Weight 1150 kg
Regulations Meets all relevant worldwide regulations for electrical, mechanical and X-ray safety, with all anode types
Type Horizontal goniometer
Radius 420 mm
Maximum usable range -40°< 2θ <160° (depending on accessories)
Encoders Direct optical encoding system for lifetime goniometer accuracy, using precisely aligned Heidenhain encoders
Long range accuracy ±0.0025°
Short range (0.5°) accuracy  ±0.0004° 
Angular reproducibility < 0.0002°
X-ray source/ Detectors/ Stages
  • Fully ceramic X-ray tubes manufactured by Malvern Panalytical’s specialized factory under cleanroom conditions
  • Tool free swap of line to point focus
  • 3 kW generator supporting all current and future X-ray tubes
  • Hybrid pixel detectors with smallest pixel size (55 x 55 µm2) available on the market
  • 5-axes cradle with 200 x 200 mm2 x, y translation
Chi rotation ±92°
Phi rotation 2 x 360°
Smallest increment 0.0001°




The first detector to bring 0D-1D-2D and 3D data to your diffractometer

The PIXcel3D is a unique 2D solid-state hybrid pixel detector. Each pixel is 55 microns x 55 microns and the detector array is 256 x 256 pixels. The detector, now based on Medipix3 technology, brings unrivalled signal to noise with its point spread function of one pixel and multiple energy discrimination levels.


X’Pert³ MRD XL Cleanroom Package

More measuring environments, minimal extra investment

The X’Pert3 MRD XL Cleanroom Package comprises smart solutions, including a fan filter unit, for the MRD XL that can be retrofitted to your existing instrument or supplied with a new one.

By filtering the air around your semiconductor wafer sample, the MRD XL Cleanroom Package helps you avoid contamination when analyzing them. In turn, this enables you to measure in a wider range of environments without having to invest in a new instrument.

X’Pert³ MRD XL Automation

A fully automated solution for complex layer stack metrology

As an additional software solution for our X’Pert3 MRD XL tool, automation can be integrated into your existing instrument to provide SECS/GEM compliant host control.

With these new capabilities, the MRD XL system can now play out its modularity and flexibility in a host controlled fab environment. This enables ensuring a contamination-free research or production environment. 


Support services 

  • Phone and remote support
  • Preventive maintenance and checkups
  • Flexible Customer Care Agreements
  • Performance certificates
  • Hardware and software upgrades
  • Local and global support


  • Turnkey solutions for elemental and structural semiconductor metrology
  • Automation and consultancy
  • Training and education

Key applications

The Malvern Panalytical X’Pert³ MRD and MRD XL are all-in-one X-ray solution systems that can be used in many industry applications, including:

Semiconductors and single crystal wafers

Whether for growth studies or device design, the measurement of layer quality, thickness, strain and alloy composition using high-resolution XRD has been at the heart of research and development in electronic and optoelectronic multilayer semiconductor devices.  With a choice of X-ray mirrors, monochromators and detectors, the X’Pert3 MRD and MRD XL offer high-resolution configurations to suit different materials systems ranging from lattice matched semiconductors, through relaxed buffer layers on to novel exotic layers on non-standard substrates

Polycrystalline solids and thin films

Polycrystalline layers and coatings are an important component of many thin films and multilayer devices. The evolution of polycrystalline layer morphology during deposition is a key study area in functional materials research and development.  X’Pert3 MRD and X’Pert3 MRD XL can be fully equipped with a range of slits, parallel beam X-ray mirror, polycapillary lens, crossed slits and monocapillaries to give the full choice of incident beam optics for reflectometry, stress, texture and phase ID.

Ultra-thin films, nanomaterials and amorphous layers

Functional devices may contain disordered, amorphous or nanocomposite thin films. The flexibility of the X’Pert3 MRD and MRD XL systems allow for the incorporation of multiple analytical methods. A range of high-resolution optics, slits and parallel plate collimators are available to give the optimum performance for grazing incidence methods, in-plane diffraction and reflectometry.

Measurement under non-ambient conditions

Studying the behavior of materials under a variety of conditions is an essential part of materials research and process development.  The X’Pert3 MRD and MRD XL are designed for the easy incorporation of the DHS1100 non-ambient sample stage from Anton Paar, enabling automated measurementsunder a range of temperatures and inert atmosphere

The future of thin film analysis.

The future of thin film analysis.

Versatile XRD research & development. High intensities for shorter measurement times. A new generation of tools for your wafer analysis.

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