X'Pert³ MRD XL

The Malvern Panalytical X’Pert³ MRD and MRD XL are all-in-one X-ray solution systems that can be used in many industry applications, including:

Semiconductors and single crystal wafers

Whether for growth studies or device design, the measurement of layer quality, thickness, strain and alloy composition using high-resolution XRD has been at the heart of research and development in electronic and optoelectronic multilayer semiconductor devices. With a choice of X-ray mirrors, monochromators, and detectors, the X’Pert3 MRD and MRD XL offer high-resolution configurations to suit different materials systems ranging from lattice-matched semiconductors, through relaxed buffer layers, onto novel exotic layers on non-standard substrates.

Polycrystalline solids and thin films

Polycrystalline layers and coatings are an important component of many thin films and multilayer devices. The evolution of polycrystalline layer morphology during deposition is a key study area in functional materials research and development. X’Pert3 MRD and X’Pert3 MRD XL can be fully equipped with a range of slits, parallel beam X-ray mirror, polycapillary lens, crossed slits, and monocapillaries to give the full choice of incident beam optics for reflectometry, stress, texture, and phase ID.

Ultra-thin films, nanomaterials and amorphous layers

Functional devices may contain disordered, amorphous or nanocomposite thin films. The flexibility of the X’Pert3 MRD and MRD XL systems allows for the incorporation of multiple analytical methods. A range of high-resolution optics, slits and parallel plate collimators are available to give the optimum performance for grazing incidence methods, in-plane diffraction, and reflectometry.

Measurement under non-ambient conditions

Studying the behavior of materials under a variety of conditions is an essential part of materials research and process development. The X’Pert3 MRD and MRD XL are designed for the easy incorporation of the DHS1100 non-ambient sample stage from Anton Paar, enabling automated measurements under a range of temperatures and inert atmosphere.

Instrument gives excellent accuracy and is of good quality.Good intensity and rapid performance. It is easy to operate.

Yifan Zheng — Zhejiang University of Technology