Thin film metrology tools based on X-ray methods, such as XRD, XRR and XRF, are fast and non-destructive. They have proven to be powerful for ex-situ investigation of critical materials parameters of thin layers, heterostructures and superlattice systems down to nanometer scale. The resulting information is essential for optimizing film quality, enhancing production efficiency and reducing costs. Malvern Panalytical offers metrology solutions for the development and production control of layer-structured based micro- and optoelectronic devices.

2830 ZT

2830 ZT

Advanced semiconductor thin film metrology solution

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Measurement Chemical identification, Thin film metrology, Elemental analysis, Contaminant detection and analysis, Elemental quantification
Elemental range Be-U
Resolution (Mn-Ka) 35eV
Sample throughput up to 25 wafers per hour
LLD 0.1 ppm - 100%
Technology X-ray Fluorescence (XRF), Wavelength Dispersive X-ray Fluorescence (WDXRF)

2830 ZT

2830 ZT

Advanced semiconductor thin film metrology solution

More details
Measurement Chemical identification, Thin film metrology, Elemental analysis, Contaminant detection and analysis, Elemental quantification
Elemental range Be-U
Resolution (Mn-Ka) 35eV
Sample throughput up to 25 wafers per hour
LLD 0.1 ppm - 100%
Technology X-ray Fluorescence (XRF), Wavelength Dispersive X-ray Fluorescence (WDXRF)

2830 ZT

X'Pert³ MRD

X'Pert³ MRD XL

2830 ZT X'Pert³ MRD X'Pert³ MRD XL

Advanced semiconductor thin film metrology solution

Versatile research & development XRD system

Versatile research, development & quality control XRD system

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Technology
Wavelength Dispersive X-ray Fluorescence (WDXRF)
Measurement type
Thin film metrology
Chemical identification
Elemental analysis
Contaminant detection and analysis
Elemental quantification