X-ray thin film analysis
X-ray metrology is the ideal tool for thin film analysis in the development and mass production of different kind of layer-structured micro- and optoelectronic devices.
X-ray metrology techniques have kept up with the progress in the industry through the development of new layer-based applications and technologies.
They continue to serve as essential tools from the R&D phase through pilot production to full-scale automated manufacturing of semiconductor devices.
Measurement tools based on X-ray methods, such as XRD, XRR and XRF, have proven to provide rapid, non-destructive, reliable and accurate access to critical thin film parameters ranging from ultra-thin single layers to complex multilayer stacks.
Find out more about our thin film analysis instruments below.
ZetiumSmart Zetium for reliable results and robust operation |
Axios FASTXRF of choice for highest throughput or shortest measurement time |
2830 ZTAdvanced semiconductor thin film metrology solution |
Epsilon 4Fast and accurate at-line elemental analysis |
X'Pert³ MRDVersatile research & development XRD system |
X'Pert³ MRD XLVersatile research, development & quality control XRD system |
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|---|---|---|---|---|---|---|
| Measurement type | ||||||
| Thin film metrology | ||||||
| Technology | ||||||
| Wavelength Dispersive X-ray Fluorescence (WDXRF) | ||||||
| X-ray Diffraction (XRD) | ||||||
| Energy Dispersive X-ray Fluorescence (EDXRF) | ||||||
