X-ray metrology is the ideal tool for thin film analysis in the development and mass production of different kind of layer-structured micro- and optoelectronic devices. X-ray metrology techniques have kept up with the progress in the industry through the development of new layer-based applications and technologies and they continue to serve as essential tools from the R&D phase through pilot production to full-scale automated manufacturing of semiconductor devices.

 

Thin film analysis solutions

Measurement tools based on X-ray methods, such as XRD, XRR and XRF, have proven to provide rapid, non-destructive, reliable and accurate access to critical thin film parameters ranging from ultra-thin single layers to complex multilayer stacks.

Zetium

X'Pert³ MRD

X'Pert³ MRD XL

Axios FAST

2830 ZT

Epsilon 4

Zetium

Elemental excellence

X'Pert³ MRD

Versatile research & development XRD system

X'Pert³ MRD XL

Versatile research, development & quality control XRD system

Axios FAST

High sample throughput

2830 ZT

Advanced semiconductor thin film metrology solution

Epsilon 4

Fast and accurate at-line elemental analysis

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Measurement type
Thin film metrology
Technology
Wavelength Dispersive X-ray Fluorescence (WDXRF)
X-ray Diffraction (XRD)
Energy Dispersive X-ray Fluorescence (EDXRF)