X-ray metrology is the ideal tool for thin film analysis in the development and mass production of different kind of layer-structured micro- and optoelectronic devices. X-ray metrology techniques have kept up with the progress in the industry through the development of new layer-based applications and technologies and they continue to serve as essential tools from the R&D phase through pilot production to full-scale automated manufacturing of semiconductor devices.

 

Thin film analysis solutions

Measurement tools based on X-ray methods, such as XRD, XRR and XRF, have proven to provide rapid, non-destructive, reliable and accurate access to critical thin film parameters ranging from ultra-thin single layers to complex multilayer stacks.

2830 ZT

2830 ZT

Advanced semiconductor thin film metrology solution

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Measurement Chemical identification, Thin film metrology, Elemental analysis, Contaminant detection and analysis, Elemental quantification
Elemental range Be-U
Resolution (Mn-Ka) 35eV
Sample throughput up to 25 wafers per hour
LLD 0.1 ppm - 100%
Technology X-ray Fluorescence (XRF), Wavelength Dispersive X-ray Fluorescence (WDXRF)

Empyrean

Empyrean

The intelligent diffractometer

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Measurement Crystal structure determination, Phase identification, Phase quantification, Contaminant detection and analysis, Residual stress, Epitaxy analysis, Interface roughness, Texture analysis, 3D structure / imaging, Reciprocal space analysis
Goniometer configuration Vertical goniometer, Θ-Θ
Particle size range 1 - 100 nm
Technology X-ray Diffraction (XRD)

Axios FAST

Axios FAST

High sample throughput

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Measurement Thin film metrology, Elemental analysis, Elemental quantification
Elemental range Be-U
Resolution (Mn-Ka) 35eV
LLD 0.1 ppm - 100%
Sample throughput Up to - 480per 8h day
Technology X-ray Fluorescence (XRF), Wavelength Dispersive X-ray Fluorescence (WDXRF)

Zetium

Zetium

Elemental excellence

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Measurement Thin film metrology, Elemental analysis, Contaminant detection and analysis, Elemental quantification
Elemental range Be-U
Resolution (Mn-Ka) 35eV
LLD 0.1 ppm - 100%
Sample throughput Up to - 240per 8h day
Technology X-ray Fluorescence (XRF), Wavelength Dispersive X-ray Fluorescence (WDXRF)

2830 ZT

2830 ZT

Advanced semiconductor thin film metrology solution

Empyrean

Empyrean

The intelligent diffractometer

Axios FAST

Axios FAST

High sample throughput

Zetium

Zetium

Elemental excellence

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Measurement Chemical identification, Thin film metrology, Elemental analysis, Contaminant detection and analysis, Elemental quantification Crystal structure determination, Phase identification, Phase quantification, Contaminant detection and analysis, Residual stress, Epitaxy analysis, Interface roughness, Texture analysis, 3D structure / imaging, Reciprocal space analysis Thin film metrology, Elemental analysis, Elemental quantification Thin film metrology, Elemental analysis, Contaminant detection and analysis, Elemental quantification
Elemental range Be-U   Be-U Be-U
Resolution (Mn-Ka) 35eV   35eV 35eV
Sample throughput up to 25 wafers per hour   Up to - 480per 8h day Up to - 240per 8h day
LLD 0.1 ppm - 100%   0.1 ppm - 100% 0.1 ppm - 100%
Goniometer configuration   Vertical goniometer, Θ-Θ    
Particle size range   1 - 100 nm    
Technology X-ray Fluorescence (XRF), Wavelength Dispersive X-ray Fluorescence (WDXRF) X-ray Diffraction (XRD) X-ray Fluorescence (XRF), Wavelength Dispersive X-ray Fluorescence (WDXRF) X-ray Fluorescence (XRF), Wavelength Dispersive X-ray Fluorescence (WDXRF)

Zetium

Axios FAST

2830 ZT

Epsilon 4

X'Pert³ MRD

X'Pert³ MRD XL

Zetium Axios FAST 2830 ZT Epsilon 4 X'Pert³ MRD X'Pert³ MRD XL

Elemental excellence

High sample throughput

Advanced semiconductor thin film metrology solution

Fast and accurate at-line elemental analysis

Versatile research & development XRD system

Versatile research, development & quality control XRD system

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Measurement type
Thin film metrology
Technology
Wavelength Dispersive X-ray Fluorescence (WDXRF)
X-ray Diffraction (XRD)
Energy Dispersive X-ray Fluorescence (EDXRF)