The successful X'Pert platform is continued by the Malvern Panalytical’s X'Pert³ range of X-ray diffraction systems. With new on-board control electronics, compliance with the latest and most stringent X-ray and motion safety norms, advances in eco-friendliness and reliability the X'Pert³ platform is ready for the future.

• Longest lifetime of incident beam components with CRISP 
• Maximum uptime with pneumatic shutters and beam attenuators 
• Easy extension towards new applications thanks to 2nd generation PreFIX technology 
• Rapid, reliable tool-free exchange of tube focus position 
• New on-board control electronics with direct internet connection 
• Compliance with the most stringent safety regulations

X'Pert³ MRD

X'Pert³ MRD

Versatile research & development XRD system

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Measurement Phase identification, Phase quantification, Thin film metrology, Residual stress, Epitaxy analysis, Interface roughness, Texture analysis, Reciprocal space analysis
Wafer mapping 100 mm
C-to-C wafer loader No
Goniometer configuration Horizontal goniometer, Θ-2Θ
Minimum step size 0.0001º
Technology X-ray Diffraction (XRD)

X'Pert³ MRD XL

X'Pert³ MRD XL

Versatile research, development & quality control XRD system

More details
Measurement Phase identification, Phase quantification, Thin film metrology, Residual stress, Epitaxy analysis, Interface roughness, Texture analysis, Reciprocal space analysis
Wafer mapping 200 mm
C-to-C wafer loader Yes
Goniometer configuration Horizontal goniometer, Θ-2Θ
Minimum step size 0.0001º
Detector PIXcel1D, PIXcel3D, Proportional counter, Scintilation detector
X-ray tube anode material Cu, Co,Cr, Mn, Fe, Mo
Technology X-ray Diffraction (XRD)

X'Pert³ MRD

X'Pert³ MRD

Versatile research & development XRD system

X'Pert³ MRD XL

X'Pert³ MRD XL

Versatile research, development & quality control XRD system

More details More details
Measurement Phase identification, Phase quantification, Thin film metrology, Residual stress, Epitaxy analysis, Interface roughness, Texture analysis, Reciprocal space analysis Phase identification, Phase quantification, Thin film metrology, Residual stress, Epitaxy analysis, Interface roughness, Texture analysis, Reciprocal space analysis
Wafer mapping 100 mm 200 mm
C-to-C wafer loader No Yes
Goniometer configuration Horizontal goniometer, Θ-2Θ Horizontal goniometer, Θ-2Θ
Minimum step size 0.0001º 0.0001º
Detector   PIXcel1D, PIXcel3D, Proportional counter, Scintilation detector
X-ray tube anode material   Cu, Co,Cr, Mn, Fe, Mo
Technology X-ray Diffraction (XRD) X-ray Diffraction (XRD)

X'Pert³ MRD

X'Pert³ MRD XL

X'Pert³ MRD X'Pert³ MRD XL

Versatile research & development XRD system

Versatile research, development & quality control XRD system

More details More details
Technology
X-ray Diffraction (XRD)
Measurement type
Phase identification
Phase quantification
Thin film metrology
Residual stress
Interface roughness
Epitaxy analysis
Texture analysis
Reciprocal space analysis